Optical microlithography XXII (24-27 February 2009, San Jose, California, United States)Levinson, Harry J; Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 2 vol, 2, isbn 978-0-8194-7527-5 0-8194-7527-0Conference Proceedings

Beam shaping: Top hat and customized intensity distributions for semiconductor manufacturing and inspectionTEIPEL, Ansgar; ASCHKE, Lutz.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 797321.1-797321.15, 2Conference Paper

A Study of Quantum Lithography for Diffraction LimitKIM, Sang-Kon.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79732X.1-79732X.7, 2Conference Paper

Freeform and SMOSOCHA, Robert.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, Part I, 797305.1-797305.17, 2Conference Paper

High-performance Intensity Slope Correction method for global process variability band improvement and printability enhancement in RET applicationsKOMIRENKO, Sergiy M.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 797318.1-797318.8, 2Conference Paper

Optical microlithography XXIII (23-25 February 2010, San Jose, California, United States)Dusa, Mircea V; Conley, Willard.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 2 vol, 2, isbn 978-0-8194-8054-5 0-8194-8054-1Conference Proceedings

22nm Logic Lithography in the Presence of Local InterconnectSMAYLING, Michael C; SOCHA, Robert J; DUSA, Mircea V et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 764019.1-764019.8, 2Conference Paper

Choosing objective functions for inverse lithography patterningYU, Jue-Chin; PEICHEN YU.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79731N.1-79731N.16, 2Conference Paper

Comparison of Clear-Field and Dark-Field Images with Optimized MasksSINN, Robert; DAM, Thuc; GLEASON, Bob et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79731V.1-79731V.8, 2Conference Paper

Fast algorithm for quadratic aberration model based on cross triple correlationWEI LIU; TINGTING ZHOU; SHIYUAN LIU et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79731M.1-79731M.9, 2Conference Paper

In-situ Mueller matrix polarimetry of projection lenses for 193-nm lithographyNOMURA, Hiroshi; HIGASHIKAWA, Iwao.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76400Q.1-76400Q.11, 2Conference Paper

Optical microlithography XXI (26-29 February 2008, San Jose, California, USA)Levinson, Harry J; Dusa, Mircea V.Proceedings of SPIE, the International Society for Optical Engineering. 2008, issn 0277-786X, isbn 978-0-8194-7109-3, 3 v, isbn 978-0-8194-7109-3Conference Proceedings

A Cost-Driven Fracture Heuristics to Minimize External Sliver LengthXU MA; SHANGLIANG JIANG; ZAKHOR, Avideh et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79732O.1-79732O.15, 2Conference Paper

A recursive cost-based approach to fracturingSHANGLIANG JIANG; XU MA; ZAKHOR, Avideh et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79732P.1-79732P.18, 2Conference Paper

Gradient-Based Fast Source Mask Optimization (SMO)YU, Jue-Chin; PEICHEN YU.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 797320.1-79732013, 2Conference Paper

Physical conversion of Stokes parameters, which are multiplied by a general Mueller matrix, into Jones vectors applicable to the lithographic calculationNOMURA, Hiroshi; TAKAHASHI, Masanori; KYOH, Suigen et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79731O.1-79731O.14, 2Conference Paper

Custom Source and Mask Optimization for 20nm SRAM and LogicSMAYLING, Michael C; COSKUN, Tamer H; KAMAT, Vishnu et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79731W.1-79731W.8, 2Conference Paper

Full-chip OPC and verification with a fast mask 3D modelHUANG, Hsu-Ting; MOKHBERI, Ali; HUIXIONG DAI et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 79732R.1-79732R.9, 2Conference Paper

Optical lithography applied to 20nm CMOS Logic and SRAMAXELRAD, V; SMAYLING, M. C; TSUJITA, K et al.Proceedings of SPIE, the International Society for Optical Engineering. 2011, Vol 7973, issn 0277-786X, isbn 978-0-8194-8532-8, 797314.1-797314.4, 2Conference Paper

A New Etch-Aware After Development Inspection (ADI) Technique for OPC ModelingJING XUE; HUANG, Jason; KAZARIAN, Aram et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76402Q.1-76402Q.8, 2Conference Paper

Methods for assessing empirical model parameters and calibration pattern measurementsXIN ZHOU; KHALIULLIN, Eldar; LAN LUAN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 764038.1-764038.6, 2Conference Paper

Optimization on Illumination Source with Design of ExperimentsHU, Helen; YI ZOU; YUNFEI DENG et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 764027.1-764027.9, 2Conference Paper

Source Mask Optimization for Advanced Lithography NodesPOONAWALA, Amyn; STANTON, William; SAWH, Chander et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7640, issn 0277-786X, isbn 978-0-8194-8054-5 0-8194-8054-1, 76401M.1-76401M.10, 2Conference Paper

A manufacturing lithographic approach for high density MRAM device using KrF double mask patterning techniqueDANIEL LIU; TOM ZHONG; TOMG, Terry et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72743F.1-72743F.7, 2Conference Paper

An innovative platform for high-throughput, high-accuracy lithography using a single wafer stageSHIBAZAKI, Yuichi; KOHNO, Hirotaka; HAMATANI, Masato et al.Proceedings of SPIE, the International Society for Optical Engineering. 2009, Vol 7274, issn 0277-786X, isbn 978-0-8194-7527-5 0-8194-7527-0, 72741I.1-72741I.12, 2Conference Paper